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발행년	- (예 : 2010-2015)

Photoresist qualification using scatterometry CD

Conference

Volkovich, R.; Avrahamov, Y.; Cohen, G.; Fallon, P.; Yin, W.

In: Proceedings of SPIE - The International Society for Optical Engineering, Metrology, Inspection, and Process Control for Microlithography XXVI. (Proceedings of SPIE - The International Society for Optical Engineering, 2012, 8324)

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Automated overlay recipe setup in high volume manufacturing: Improving performance, efficiency, robustness

Conference

Sparka, C.; Golotsvan, A.; Avrahamov, Y.; Sitzmann, W.; Tien, D.

In: Proceedings of SPIE - The International Society for Optical Engineering, Metrology, Inspection, and Process Control for Microlithography XXIII. (Proceedings of SPIE - The International Society for Optical Engineering, 2009, 7272)

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45 nm design rule in-die overlay metrology on immersion lithography processes

Conference

Shih, Y.-H.; Huang, G.K.C.; Yu, C.-C.; Adel, M.; Izikson, P.; Kassel, E.; Avrahamov, Y.; Huang, C.-C.K.; Mathur, S.; Huang, C.-J.; Tien, D.

In: Proceedings of SPIE - The International Society for Optical Engineering, Metrology, Inspection, and Process Control for Microlithography XXI. (Proceedings of SPIE - The International Society for Optical Engineering, 2007, 6518(PART 2))

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AIM technology for non-volatile memories microelectronics devices

Conference

Rigolli, P.L.; Rozzoni, L.; Turco, C.; Iessi, U.; Polli, M.; Kassel, E.; Izikson, P.; Avrahamov, Y.

In: Proceedings of SPIE - The International Society for Optical Engineering, Metrology, Inspection, and Process Control for Microlithography XX. (Proceedings of SPIE - The International Society for Optical Engineering, 2006, 6152 II)

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Lithography rework reduction and improved process control using AIM targets on aluminum layers in the high volume production of 110nm DRAM devices

Conference

Hofmann, D.; Rabe, F.; Avrahamov, Y.; Sparka, C.

In: Proceedings of SPIE - The International Society for Optical Engineering, Metrology, Inspection, and Process Control for Microlithography XX. (Proceedings of SPIE - The International Society for Optical Engineering, 2006, 6152 II)

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Overlay measurement accuracy verification using CD-SEM and application to the quantification of WIS caused by BARC

Conference

Lecarpentier, L.; Vachellerie, V.; Feneyrou, A.; Guillot, S.; Thony, P.; Kassel, E.; Avrahamov, Y.; Huang, C.-C.K.; Felten, F.; Polli, M.

In: Progress in Biomedical Optics and Imaging - Proceedings of SPIE, Metrology, Inspection, and Process Control for Microlithography XIX. (Progress in Biomedical Optics and Imaging - Proceedings of SPIE, 2005, 5752(III):1413-1423)

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In-situ control of wafer charge neutralization during high current ion implants

Conference

Shauly, E.N.; Koltin, E.; Munin, I.; Avrahamov, Y.

In: Materials Research Society Symposium Proceedings, Materials Synthesis and Processing Using Ion Beams. (Materials Research Society Symposium Proceedings, 1994, 316:633-638)

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In-Situ Control of Wafer Charge Neutralization During High Current Ion Implants.

Conference

Shauly, E.N.; Koltin, E.; Munin, I.; Avrahamov, Y.

MRS Online Proceedings Library; 01/19/1993, Vol. 316, pN.PAG-1, 1p

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