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발행년	- (예 : 2010-2015)

Plasma-assisted deposition of thin carbon films from methane and the influence of the plasma parameters and additional gases

Academic Journal

Hamelmann, F. ; Aschentrup, A.; Brechling, A.; Heinzmann, U.; Abrashev, M.; Szekeres, A.; Gesheva, K.

In Vacuum 5 November 2004 76(2-3):139-142

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Determination of layer-thickness fluctuations in Mo/Si multilayers by cross-sectional HR-TEM and X-ray diffraction.

Academic Journal

Aschentrup, A.; Hachmann, W.; Westerwalbesloh, T.; Lim, Y.C.; Kleineberg, U.; Heinzmann, U.

Applied Physics A: Materials Science & Processing. 2003, Vol. 77 Issue 5, p607-611. 5p.

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Fabrication and characterization of EUV multilayer mirrors optimized for small spectral reflection bandwidth.

Academic Journal

Lim, Y.C.; Westerwalbesloh, T.; Aschentrup, A.; Wehmeyer, O.; Haindl, G.; Kleineberg, U.; Heinzmann, U.

Applied Physics A: Materials Science & Processing. 2001, Vol. 72 Issue 1, p121. 4p.

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Plasma-assisted deposition of thin silicon oxide films in a remote PECVD reactor and characterization of films produced under different conditions

Academic Journal

Hamelmann, F.; Aschentrup, A.; Brechling, A.; Heinzmann, U.; Gushterov, A.; Szekeres, A.; Simeonov, S.

In: Vacuum. (Vacuum, 16 August 2004, 75(4):307-312)

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Thin molybdenum oxide films produced by molybdenum pentacarbonyl 1-methylbutylisonitrile with plasma-assisted chemical vapor deposition

Academic Journal

Hamelmann, F.; Brechling, A.; Aschentrup, A.; Heinzmann, U.; Jutzi, P.; Sandrock, J.; Siemeling, U.; Ivanova, T.; Gesheva, K.; Szekeres, A.

In: Thin Solid Films. (Thin Solid Films, 15 January 2004, 446(2):167-171)

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Effect of substrate heating and ion beam polishing on the interface quality in Mo/Si multilayers - X-ray comparative study

Academic Journal

Anopchenko, A.; Jergel, M.; Majková, E.; Luby, Š.; Holý, V.; Aschentrup, A.; Kolina, I.; Cheol Lim, Y.; Haindl, G.; Kleineberg, U.; Heinzmann, U.

In: Physica B: Condensed Matter. (Physica B: Condensed Matter, October 2001, 305(1):14-20)

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Metal oxide/silicon oxide multilayer with smooth interfaces produced by in situ controlled plasma-enhanced MOCVD

Academic Journal

Hamelmann, F.; Haindl, G.; Schmalhorst, J.; Aschentrup, A.; Majkova, E.; Kleineberg, U.; Heinzmann, U.; Klipp, A.; Jutzi, P.; Anopchenko, A.; Jergel, M.; Luby, S.

In: Thin Solid Films. (Thin Solid Films, 10 January 2000, 358(1):90-93)

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Thermal behaviour of Co/Si/W/Si multilayers under rapid thermal annealing

Academic Journal

Luby, S.; Jergel, M.; Anopchenko, A.; Aschentrup, A.; Hamelmann, F.; Majkova, E.; Kleineberg, U.; Heinzmann, U.

In: Applied Surface Science. (Applied Surface Science, 11 August 1999, 150(1):178-184)

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Silicon oxide nanolayers for soft X-ray optics produced by plasma enhanced CVD

Periodical

Hamelmann, F.; Aschentrup, A.; Schmalhorst, J.; Kleineberg, U.; Heinzmann, U.; Dittmar, K.; Jutzi, P.; Hamelmann, F.; Aschentrup, A.; Schmalhorst, J.; Kleineberg, U.; Heinzmann, U.; Dittmar, K.; Jutzi, P.

Journal de Physique IV - Proceedings; September 2001, Vol. 11 Issue: 1 pPr3-431-Pr3-436, 4313434p

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