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Precipitates formation and its impact on the structure of plasma-deposited fluorinated silicon oxide films

Document Type

Journal

Author

Wu, J; Wang, YL; Kuo, CT

Source

SURFACE & COATINGS TECHNOLOGY; FEB 24 2006, 200 10, p3303-p3308, 6p.

Subject

Language

English

ISSN

02578972

Online Access

Full Text (ScienceDirect) Web of Science JCR 저널정보 Scopus Find it@PNU

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