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Characteristics of the nanoscale titanium film deposited by plasma enhanced chemical vapor deposition and comparison of the film properties with the film by physical vapor deposition

Document Type

Journal

Author

Lee, JW; Kim, SH; Kwak, NJ; Lee, YJ; Sohn, HC; Kim, JW; Sun, HJ

Source

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B; MAY-JUN 2006, 24 3, p1460-p1463, 4p.

Subject

Language

English

ISSN

10711023

Online Access

Web of Science Scopus Find it@PNU

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