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Effect of nitrogen incorporation on electrical properties of high-k nanomixed HfxAlyOz film capacitors grown on Ru metal electrodes by atomic layer deposition

Document Type

Journal

Author

Seong, NJ; Yoon, SG; Yeom, SJ; Woo, HK; Kil, DS; Roh, JS; Sohn, HC

Source

INTEGRATED FERROELECTRICS; 2005, 74 p131-p136, 6p.

Subject

Language

English

ISSN

10584587

Online Access

Web of Science JCR 저널정보 Find it@PNU

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