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Effect of fluorine incorporation on silicon dioxide prepared by high density plasma chemical vapor deposition with SiH4/O-2/NF3 chemistry

Document Type

Journal

Author

Kim, JH; Chung, CO; Sheen, D; Sohn, YS; Sohn, HC; Kim, JW; Park, SW

Source

JOURNAL OF APPLIED PHYSICS; AUG 1 2004, 96 3, p1435-p1442, 8p.

Subject

Language

English

ISSN

00218979

Online Access

Full Text (AIP) Web of Science JCR 저널정보 Scopus Find it@PNU

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