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Processing dependent behavior of soft imprint lithography on the 1--10-nm scale

Document Type

Journal

Author

Hua, F; Gaur, A; Sun, YG; Word, M; Jin, N; Adesida, I; Shim, M; Shim, A; Rogers, JA

Source

IEEE TRANSACTIONS ON NANOTECHNOLOGY; MAY 2006, 5 3, p301-p308, 8p.

Subject

Language

English

ISSN

1536125X

Online Access

Full Text (IEEE) Web of Science JCR 저널정보 Scopus Find it@PNU

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