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Negative bias temperature instability on three oxide thicknesses (1.4/2.2/5.2 nm) with nitridation variations and deuteration

Document Type

Journal

Author

Hook, TB; Bolam, R; Clark, W; Burnham, J; Rovedo, N; Schutz, L

Source

MICROELECTRONICS RELIABILITY; JAN 2005, 45 1, p47-p56, 10p.

Subject

Language

English

ISSN

00262714

Online Access

Full Text (ScienceDirect 종량제) Web of Science JCR 저널정보 Scopus Find it@PNU

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