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Plasma enhanced atomic layer deposition of silicon nitride using magnetized very high frequency plasma

Document Type

Journal

Author

Ji, You Jin; Kim, Hae In; Kang, Ji Eun; Choi, Seung Yup; Kim, Ki Hyun; Kim, Doo San; Ellingboe, A. R.; Kim, Hye Min; Yeom, Geun Young; Kim, Dong Woo

Source

NANOTECHNOLOGY; JUL 1 2024, 35 27, p275701 11p.

Subject

Language

English

ISSN

13616528

Online Access

Full Text (IOP Science) Full Text (IOP) Web of Science JCR 저널정보 Scopus Find it@PNU

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