학술논문

Novel back end-of-line process scheme for improvement of negative bias temperature instability lifetime

Document Type

Journal

Author

Source

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS; APR 2006, 45 4A, p2455-p2458, 4p.

Subject

Language

English

ISSN

00214922

이메일

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