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The improvement of thermal stability of nickel silicide by adding a thin Zr interlayer

Document Type

Journal

Author

Huang, W; Zhang, LC; Gao, YZ; Jin, HY

Source

MICROELECTRONIC ENGINEERING; FEB 2006, 83 2, p345-p350, 6p.

Subject

Language

English

ISSN

01679317

Online Access

Full Text (ScienceDirect) Web of Science JCR 저널정보 Scopus Find it@PNU

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