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Effect of a thin W interlayer on the thermal stability and electrical characteristics of NiSi film

Document Type

Journal

Author

Huang, W; Zhang, LC; Gao, YZ; Jin, HY; Ning, BJ; Zhang, GQ

Source

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B; NOV-DEC 2005, 23 6, p2304-p2308, 5p.

Subject

Language

English

ISSN

10711023

Online Access

Web of Science Scopus Find it@PNU

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