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Programmed rate chemical vapor deposition protocols

Document Type

Journal

Author

Yang, D; Kristof, JJ; Jonnalagadda, R; Rogers, BR; Hillman, JT; Foster, RF; Cale, TS

Source

JOURNAL OF THE ELECTROCHEMICAL SOCIETY; FEB 2000, 147 2, p723-p730, 8p.

Subject

Language

English

ISSN

00134651

Online Access

Web of Science JCR 저널정보 Scopus Find it@PNU

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