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Diffusion barrier properties of reactively sputtered W-Ti-N thin films

Document Type

Journal

Author

Kuchuk, AV; Kladko, VP; Machulin, VF; Piotrowska, A; Kaminska, E; Golaszewska, K; Ratajczak, R; Minikayev, R

Source

REVIEWS ON ADVANCED MATERIALS SCIENCE; DEC 2004, 8 1, p22-p26, 5p.

Subject

Language

English

ISSN

16065131

Online Access

Web of Science JCR 저널정보 Find it@PNU

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