학술논문

Effect of Si/SiO2 interface on silicon and boron diffusion in thermally grown SiO2
Document Type
Journal
Source
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS; NOV 2004, 43 11B, p7837-p7842, 6p.
Subject
Language
English
ISSN
00214922