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Silicon anisotropic etching without attacking aluminum with Si and oxidizing agent dissolved in TMAH solution

Document Type

Journal

Author

Fujitsuka, N; Hamaguchi, K; Funabashi, H; Kawasaki, E; Fukada, T

Source

SENSORS AND ACTUATORS A-PHYSICAL; SEP 1 2004, 114 2-3, p510-p515, 6p.

Subject

Language

English

ISSN

09244247

Online Access

Full Text (ScienceDirect) Web of Science JCR 저널정보 Scopus Find it@PNU

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