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Effects of substrate temperature on properties of pulsed dc reactively sputtered tantalum oxide films

Document Type

Journal

Author

Jain, P; Juneja, JS; Bhagwat, V; Rymaszewski, EJ; Lu, TM; Cale, TS

Source

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A; MAY-JUN 2005, 23 3, p512-p519, 8p.

Subject

Language

English

ISSN

07342101

Online Access

Full Text (AIP) Web of Science JCR 저널정보 Scopus Find it@PNU

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