학술논문
Alignment method, alignment apparatus, and exposure apparatus
Document Type
Patent
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Abstract
In the present invention, the number of brightness changes detected at the same position while a substrate moves by a certain distance is added up, a plurality of edge count data arranged corresponding to the detected positions of the brightness changes is obtained, a plurality of correlation value data by performing a correlation operation for the plurality of calculated edge count data while moving a template is obtained, positions of the plurality of patterns based on a plurality of correlation value data exceeding a predetermined threshold value are identified, a position of a pattern close to a target position of an imaging device is selected, and a photomask is moved in the direction substantially orthogonal to the conveying direction of the substrate so that the amount of the position displacement between the selected position of the pattern and the target position of the imaging device is a predetermined value.