학술논문
Polymerizable Fluoromonomer, Fluoropolymer, Resist Material, and Method of Pattern Formation
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Patent
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Abstract
Disclosed is a polymerizable fluoromonomer represented by the following general formula (1). [chemical expression included] In the formula, R1 represents a hydrogen atom, methyl group, fluorine atom, or trifluoromethyl group. n is an integer of 0 or 1, and m is that of from 1 to (3+n). R2 and R3 each independently represents a hydrogen atom or a protective group. A resist containing a fluoropolymer obtained by polymerizing or copolymerizing the monomer is suitable for use in microfabrication by immersion exposure or by a double patterning process based on immersion exposure.