학술논문

X-ray Diffraction Study of the Ultrathin Al2O3 Layer on NiAl(110)
Document Type
Academic Journal
Source
Science. Mar 12, 2004 303(5664):1652-1656
Subject
Language
English
ISSN
0036-8075
Abstract
Ultrathin Al2O3 layers on alloys are used as templates for model catalysts, tunneling barriers in electronic devices, or corrosion-resistant layers. The complex atomic structure of well-ordered alumina overlayers on NiAl(110) was solved by surface x-ray diffraction. The oxide layer is composed of a double layer of strongly distorted hexagonal oxygen ions that hosts aluminum ions on both octahedral and tetrahedral sites with equal probability. The alumina overlayer exhibits a domain structure that can be related to characteristic growth defects and is generated during the growth of a hexagonally ordered overlayer (Al2O3) on a body-centered cubic (110) substrate (NiAl).