학술논문

박막,센서 : EDS 분석과 모델링에 의한 박막두께 측정 방법에 관한 연구
Thin Films and Sensors : Determination of Thin Film Thickness by EDS Analysis and its Modeling
Document Type
Article
Source
전기전자재료학회논문지(J. Korean Inst. Electr. Electron. Mater. Eng.) / Journal of the Korean Institute of Electrical and Electronic Material Engineers. Aug 01, 2011 24(8):647
Subject
Thin film
Thickness
EDS
Characteristic X-ray
Model
Language
Korean
ISSN
1226-7945
Abstract
In this study, a method to measure the thickness of thin film by EDS (energy dispersive spectroscopy) is suggested. We have developed a model which calculates the thickness of thin film from the characteristic x-ray intensity ratio of the elements in thin film and substrate by considering incident electron beam energy, x-ray generation curve, backscattering and absorption of x-ray, take-off angle of x-ray and tilt angle of the sample. We obtained the relation curve between the film thickness measured experimentally and the x-ray intensity ratio of elements. The film thicknesses calculated from the model agrees quite well with those measured experimentally. Therefore, the thin film thickness can be measured rapidly and accurately by using the model developed in this study and the x-ray intensity ratio obtained in EDS analysis.

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