부산대학교 도서관

Ternary Mo-Cu-N films were deposited on Si wafer substrates with various copper contents by magnetron sputtering method using Mo target and Cu target in Ar/N2 gaseous atmosphere. As increasing N2 pressure, the microstructure of Mo-N films changed from γ-Mo2N of (111) having face-centered-cubic (FCC) structure to δ-MoN of (200) having hexagonal structure. Detailed the microstructures of the Mo-Cu-N coatings were studied by X-ray diffraction, scanning electron microscopy and field emission transmission electron micro-scope. The results indicated that the incorporation of copper into the growing Mo-N coating led to the Mo2N and MoN crystallites were more well-distributed and refined and the copper existed in grain boundary. Ternary Mo-Cu-N films had a composite microstructure of the nanosized crystal crystalline γ-Mo2N and δ-MoN surrounded by amorphous Cu3N phase.