학술논문
반응성 DC 마그네트론 스퍼터링 증착에서 방전 전류에 따른 TiOx 박막의 구조 변환
Structural Change of TiOx Thin Films vs. Plasma Discharge Current in Reactive DC Magnetron Sputtering
Structural Change of TiOx Thin Films vs. Plasma Discharge Current in Reactive DC Magnetron Sputtering
Document Type
Article
Source
새물리, 74(2), pp.121-125 Feb, 2024
Subject
Language
한국어
ISSN
2289-0041
0374-4914
0374-4914
Abstract
본 연구에서는 반응성 DC 마그네트론(Nd-Fe-B) 스퍼터링을 활용하여 다양한 조성과 결정 특성을 갖는 TiOx 박막을 증착하는 과정을 수행했다. 유리 기판 위에 2인치 지름의 Ti 타겟을 사용하여 박막을 증착하였다. 이 과정에서 플라즈마와 타겟의 전기적 상태와 직접적 연결성이 있는 방전 전류(0.25, 0.27, · · · , 0.51 A)를 변화시키면서 박막을 성장하였다. 증착 조건에 따른 박막의 화학적 및 구조적 특성은 X-선 광전자 분광법과 X-선 회절 방법을 통해 정량적으로 확인되었다. 이 결과를 바탕으로, 플라즈마 방전 전류가 증가함에 따라 TiOx 박막의 산소량이 감소하며, 아나타스 TiO2에서 Ti2O3로, 그리고 TiO와 TiO0.43 상으로의 조성 변화 및 결정 크기의 증가함을 관찰하였다. 특히 타겟의 모드변이에 의한 이차전자 수율과 직접적 연관성이 있는 플라즈마 전압과 플라즈마가 전달하는 에너지가 박막의 화학적 조성과 결정크기에 각각 직접적인 영향을 미침을 확인할 수 있었다.
Reactive DC magnetron (Nd-Fe-B) sputtering was used to deposit TiOx thin films. The growth was carried out with a 2-inch diameter Ti target on a soda-lime glass substrate. Different plasma discharge currents (0.25, 0.27, · · · , 0.51 A) were applied to alter the plasma and target conditions. Changes in the chemical and structural properties of the films, dependent on the discharge current were verified through X-ray Photoelectron Spectroscopy and X-ray Diffraction analyses. As the current increased, it led to the reduction of oxygen in the TiOx films and a structural transformation from anatase TiO2 to Ti2O3 and further to TiO and TiO0.43 phases, along with an increase in crystal size. This chemical and crystallographic evolution of thin films were found to be affected by plasma potential, which is an indicator of the secondary electron yield of the target, and plasma energy, respectively.
Reactive DC magnetron (Nd-Fe-B) sputtering was used to deposit TiOx thin films. The growth was carried out with a 2-inch diameter Ti target on a soda-lime glass substrate. Different plasma discharge currents (0.25, 0.27, · · · , 0.51 A) were applied to alter the plasma and target conditions. Changes in the chemical and structural properties of the films, dependent on the discharge current were verified through X-ray Photoelectron Spectroscopy and X-ray Diffraction analyses. As the current increased, it led to the reduction of oxygen in the TiOx films and a structural transformation from anatase TiO2 to Ti2O3 and further to TiO and TiO0.43 phases, along with an increase in crystal size. This chemical and crystallographic evolution of thin films were found to be affected by plasma potential, which is an indicator of the secondary electron yield of the target, and plasma energy, respectively.