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Integrated Approaches for Surface Chemistry Control in Plasma Processing

Document Type

Journal Article

Author

A. Koshiishi; A. Ranjan; A. Suzuki; B. Lane; G.S. Hwang; H. Higuchi; H. Ueda; K. Ishibashi; L. Raja; M. Wang; Peter L. G. Ventzek; R. Upadhyay; T. Iwao; Y. Kobayashi

Source

JSAP Annual Meetings Extended Abstracts. 2015, :1751

Subject

13p-1F-2
Plasma Processing
Surface Chemistry
プラズマエレクトロニクス
プラズマエレクトロニクス分科内招待講演

Language

English

ISSN

2436-7613

Online Access

Open Access (JSTAGE) Find it@PNU

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