학술논문

Dependence of implantation temperature on chemical behavior of hydrogen isotopes implanted into the oxygen-contained boron film / 酸素含有ボロン膜に照射された水素同位体の化学的挙動における照射温度依存性
Document Type
Journal Article
Source
Proceedings of Annual / Fall Meetings of Atomic Energy Society of Japan. 2006, :820
Subject
Boronization
Oxygen impurities
Tritium
トリチウム
ボロニゼーション
酸素不純物
Language
Japanese

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