학술논문
Fabrication and Characterization of High-k Gate Insulating Films by RF-Sputtering Method / RFスパッタ法を用いたHigh-k ゲート絶縁膜の作製と評価
Document Type
Journal Article
Author
Source
JSAP Annual Meetings Extended Abstracts. 2020, :1214
Subject
Language
Japanese
ISSN
2436-7613