학술논문
Ultra-high-temperature Oxidation under Low Oxygen Partial Pressure toward Ideal SiO2/SiC Interface / 理想SiO2/SiC界面の実現に向けた超高温・低酸素分圧酸化の検討
Document Type
Journal Article
Author
Source
JSAP Annual Meetings Extended Abstracts. 2016, :3302
Subject
Language
Japanese
ISSN
2436-7613