학술논문
Plasma Processing Thin Film Formation and Surface Modification by Low Temperature Plasmas / プラズマプロセス
Document Type
Journal Article
Author
Source
核融合研究 / Kakuyūgō kenkyū. 1992, 68(6):577
Subject
Language
Japanese
ISSN
0451-2375
1884-9571
1884-9571
Abstract
Plasma processing including ion processing is reviewed. The advantage of plasma processing, compared with usual thermal processing, is described.In the plasma processing, the plasma-surface interaction for thin film formation is addressed as a key issue.As the example of plasma processing, carbonization experiments based on plasma CVD and nitridation experiments using ECR plasma are briefly introduced.