학술논문

300-mm full-factory simulations for 90- and 65-nm IC manufacturing
Document Type
Author Abstract
Source
IEEE Transactions on Semiconductor Manufacturing. August, 2004, Vol. 17 Issue 3, p292, 7 p.
Subject
Semiconductor chips
Integrated circuits
Integrated circuit fabrication
Semiconductor device
Standard IC
Integrated circuit fabrication
Business
Computers
Electronics
Electronics and electrical industries
Language
English
ISSN
0894-6507
Abstract
We present enabling capabilities and key results realized by the development and implementation of 300-mm full-factory simulation tools supporting Intel's 90-nm high-volume manufacturing and 65-nm technology development factories. We discuss key attributes of these simulators which are being utilized for strategic fab capacity planning, automation systems designs, and tactical manufacturing execution and decision support for continuous improvement. These simulators capture the dynamic behaviors of hundreds of production tools with thousands of production and engineering lots and integrate automated material handling systems (AMHS) behaviors in these production simulations. The paper discusses specific topical areas where these tools have found widespread use and emphasizes the importance of periodic model validation and calibration to the real factory. Index Terms--Automated material handling systems (AMHS) simulation, fabrication simulation, full-factory modeling, high mix, high-volume manufacturing, sensitivity analysis, technology development, 300-mm wafer manufacturing.