학술논문

Molecular adsorption to Li[Mo.sub.3][Se.sun.3] nanowire film chemiresistors
Document Type
Author Abstract
Source
Analytical Chemistry. Feb 15, 2006, Vol. 78 Issue 4, p1306, 6 p.
Subject
Adsorption -- Analysis
Atomic force microscopy -- Observations
Electric resistance -- Research
Dielectric films -- Structure
Dielectric films -- Properties
Thin films -- Structure
Thin films -- Properties
Language
English
ISSN
0003-2700
Abstract
Thin films of metallic nanowire bundles derived from the Chevrel compound Li[Mo.sub.3][Se.sub.3] undergo reversible increases of their electrical resistance (up to 70%) upon exposure to vapors of organic solvents (Qi, X. B.; Osterloh, F. E. d. Am. Chem. Soc. 2005, 127 (21), 7666-7667). Using quartz crystal microbalance measurements with four analytes, we demonstrate here that the temporal and steady-state resistance changes of the films depend on the time following the adsorption and on the number of molecules that adsorb to the nanowire films at a given pressure. The adsorption ability of the films and the corresponding film resistance increase in the row: hexane < THF < ethanol < DMSO, closely following the polarities of the solvents. On average, ~[10.sup.5] analyte molecules per Li[Mo.sub.3][Se.sub.3] unit are required to produce a measurable electrical response. Atomic force microscopy scans on nanowire films reveal that analytes deposit on top of the nanowire bundles and cause the films to swell by 46% in volume. The temporal and steady-state resistance data of the Li[Mo.sub.3][Se.sub.3] chemiresistors can be explained by assuming that coating of the nanowire bundles with analyte molecules reduces the interwire charge transport in the films.