학술논문
Diagnostic and monitoring tools of large scale Si-manufacturing: trace-analytical tools and techniques in Si-wafer manufacturing
Document Type
Academic Journal
Source
IEEE Transactions on Semiconductor Manufacturing. August 1996, Vol. 9 Issue 3, p428, 9 p. table
Subject
Language
ISSN
0894-6507
Abstract
In order to facilitate fast corrective actions, all process media, crucial process steps and intermediate product stages of wafering must be monitored by suitable analytical tools. The analyzes have to provide reliable, relevant and real-time results at justifiable economy. Preferably, they should be serviceable in on-line configuration under strict SPC conditions. The following chapters outline the performance of the few analytical techniques, that optimally satisfy these requirements.