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Investigation of aluminum film properties and microstructure for replacement metal gate application

Document Type

Article

Author

Huang, R.P.; Tsai, T.C.; Lin, Welch; Huang, H.F.; Tsai, M.C.; Hsu, H.K.; Hsu, C.M.; Lin, J.F.; Yang, C.L.; Wu, J.Y.

Source

In Microelectronic Engineering June 2013 106:56-62

Subject

Language

ISSN

0167-9317

Online Access

Full Text (ScienceDirect) Web of Science JCR 저널정보 Scopus Find it@PNU

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