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SIMS study of Cu trapping and migration in low- k dielectric films

Document Type

Article

Author

Li, Yupu; Hunter, Jerry; Tate, Tom J.

Source

In Applied Surface Science 2004 231:791-795

Subject

Language

ISSN

0169-4332

Online Access

Full Text (ScienceDirect) Web of Science JCR 저널정보 Scopus Find it@PNU

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