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Low temperature MOSFET technology with Schottky barrier source/drain, high-K gate dielectric and metal gate electrode

Document Type

Article

Author

Zhu, Shiyang; Yu, H.Y.; Chen, J.D.; Whang, S.J.; Chen, J.H.; Shen, Chen; Zhu, Chunxiang; Lee, S.J.; Li, M.F.; Chan, D.S.H.; Yoo, W.J.; Du, Anyan; Tung, C.H.; Singh, Jagar; Chin, Albert; Kwong, D.L.

Source

In Solid State Electronics 2004 48(10):1987-1992

Subject

Language

ISSN

0038-1101

Online Access

Full Text (ScienceDirect) Web of Science JCR 저널정보 Scopus Find it@PNU

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