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A new, laminar flow photo-CVD method for preparing hydrogenated amorphous silicon films

Document Type

Article

Author

Furukawa, Akihiko; Iida, Yoshinori; Yamaguchi, Tetsuya; Harada, Nozomu; Nozaki, Hidetoshi; Kamimura, Takaaki; Yano, Kensaku; Ito, Hiroshi; Okumura, Katsuya

Source

In Journal of Non-Crystalline Solids 1991 137 Part 2:665-668

Subject

Part II
Section 12. Deposition and growth

Language

ISSN

0022-3093

Online Access

Full Text (ScienceDirect) Web of Science JCR 저널정보 Scopus Find it@PNU

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