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Understanding the EOT–Jg degradation in Ru/SrTiOx/Ru metal–insulator–metal capacitors formed with Ru atomic layer deposition

Document Type

Article

Author

Popovici, M.; Redolfi, A.; Aoulaiche, M.; van den Berg, J.A.; Douhard, B.; Swerts, J.; Bailey, P.; Kaczer, B.; Groven, B.; Meersschaut, J.; Conard, T.; Moussa, A.; Adelmann, C.; Delabie, A.; Fazan, P.; Van Elshocht, S.; Jurczak, M.

Source

In Microelectronic Engineering 1 November 2015 147:108-112

Subject

Language

ISSN

0167-9317

Online Access

Full Text (ScienceDirect) Web of Science JCR 저널정보 Scopus Find it@PNU

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