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Performance of a high resolution chemically amplified electron beam resist at various beam energies

Document Type

Article

Author

Yang, D.X.; Frommhold, A.; McClelland, A.; Roth, J.; Rosamond, M.; Linfield, E.H.; Osmond, J.; Palmer, R.E.; Robinson, A.P.G.

Source

In Microelectronic Engineering 2 April 2016 155:97-101

Subject

Language

ISSN

0167-9317

Online Access

Full Text (ScienceDirect) Web of Science JCR 저널정보 Scopus Find it@PNU

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