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Thermal oxidation of strained Si/SiGe: impact of surface morphology and effect on MOS devices

Document Type

Article

Author

Olsen, S.H; O’Neill, A.G; Norris, D.J; Cullis, A.G; Bull, S.J; Chattopadhyay, S; Kwa, K.S.K; Driscoll, L.S; Waite, A.M; Tang, Y.T; Evans, A.G.R

Source

In Materials Science & Engineering B 15 June 2004 109(1-3):78-84

Subject

Language

ISSN

0921-5107

Online Access

Full Text (ScienceDirect) Web of Science JCR 저널정보 Scopus Find it@PNU

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