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Optimization of the inlet velocity profile for uniform epitaxial growth in a vertical metalorganic chemical vapor deposition reactor

Document Type

Article

Author

Cho, W.K; Choi, D.H ; Kim, M.-U

Source

In International Journal of Heat and Mass Transfer 1999 42(22):4143-4152

Subject

Language

ISSN

0017-9310

Online Access

Full Text (ScienceDirect) Web of Science JCR 저널정보 Scopus Find it@PNU

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