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Development of EUV interference lithography for 25 nm line/space patterns

Document Type

Article

Author

Sahoo, A.K.; Chen, P.-H.; Lin, C.-H.; Liu, R.-S.; Lin, B.-J.; Kao, T.-S.; Chiu, P.-W.; Huang, T.-P.; Lai, W.-Y.; Wang, J.; Lee, Y.-Y.; Kuan, C.-K.

Source

In Micro and Nano Engineering September 2023 20

Subject

Language

ISSN

2590-0072

Online Access

Full Text (ScienceDirect 종량제) Full Text (ScienceDirect O/A) Web of Science JCR 저널정보 Scopus Find it@PNU

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