학술논문

Tungsten silicide composition analysis by Rutherford backscattering spectroscopy, Auger electron spectroscopy, and x-ray photoelectron spectroscopy
Document Type
Article
Source
In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. (Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, May/June 1998, 16(3):1103-1105)
Subject
Language
English
ISSN
07342101