학술논문
Managing effects in CD control from PED and PEB in advanced DUV photomask manufacturing using FEP-171 resist
Document Type
Conference Paper
Source
In: Progress in Biomedical Optics and Imaging - Proceedings of SPIE , Advances in Resist Technology and Processing XXII. (Progress in Biomedical Optics and Imaging - Proceedings of SPIE, 2005, 5753(II):1119-1128)
Subject
Language
English
ISSN
16057422