학술논문
The Role of Selective Pattern Etching to Improve the Ohmic Contact Resistance and Device Performance of AlGaN/GaN HEMTs
Document Type
Article
Author
Source
In: International Journal of Nanoelectronics and Materials . (International Journal of Nanoelectronics and Materials, December 2021, 14 Special Issue InCAPE:21-28)
Subject
Language
English
ISSN
22321535
19855761
19855761