학술논문
Stochastic simulation of pattern formation for negative-type chemically amplified resists in extreme ultraviolet lithography
Document Type
Article
Author
Source
In: Journal of Photopolymer Science and Technology . (Journal of Photopolymer Science and Technology, 2020, 33(1):53-56)
Subject
Language
English
ISSN
13496336
09149244
09149244