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Exploiting atomic layer deposition for fabricating sub-10 nm X-ray lenses

Document Type

Article

Author

Rösner, B.; Koch, F.; Döring, F.; Bosgra, J.; Guzenko, V.A.; Kirk, E.; Watts, B.; Raabe, J.; David, C.; Meyer, M.; Ornelas, J.L.; Fink, R.H.; Stanescu, S.; Swaraj, S.; Belkhou, R.

Source

In: Microelectronic Engineering. (Microelectronic Engineering, 5 May 2018, 191:91-96)

Subject

Language

English

ISSN

01679317

Online Access

Full Text (ScienceDirect) Web of Science JCR 저널정보 Scopus Find it@PNU

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