학술논문
Crystallization of (Hf, Zr)O2 thin films via non-heating process and their application to ferroelectric-gate thin film transistors
Document Type
Article
Author
Source
In: Japanese Journal of Applied Physics . (Japanese Journal of Applied Physics, 1 November 2023, 62(SM))
Subject
Language
English
ISSN
13474065
00214922
00214922