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Automatic monitoring of deposition conditions during rf sputtering of dielectric materials

Document Type

Article

Author

Pitt, C.; Kirk, I.; Stevens, R.

Source

In: Vacuum. (Vacuum, June 1975, 25(6):265-271)

Subject

Language

English

ISSN

0042207X

Online Access

Full Text (ScienceDirect) Web of Science JCR 저널정보 Scopus Find it@PNU

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