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Integration of MOCVD SBT stacked ferroelectric capacitors in a 0.35 μm CMOS technology

Document Type

Article

Author

Maes, D.; Everaert, J.-L.; Goux, L.; Lisoni, J.G.; Paraschiv, V.; Schwitters, M.; Haspeslagh, L.; Wouters, D.J.; Artoni, C.; Caputa, C.; Casella, P.; Corallo, G.; Russo, G.; Zambrano, R.; Monchoix, H.; Van Autryve, L.

Source

In: Integrated Ferroelectrics. (Integrated Ferroelectrics, 2004, 66:71-83)

Subject

Language

English

ISSN

10584587
16078489

Online Access

Web of Science JCR 저널정보 Scopus Find it@PNU

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