학술논문
Advanced transformational analysis applied to e-beam proximity effect correction
Document Type
Conference Paper
Author
Source
In: Proceedings of SPIE - The International Society for Optical Engineering , Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing III. (Proceedings of SPIE - The International Society for Optical Engineering, 24 June 1993, 1924:150-170)
Subject
Language
English
ISSN
1996756X
0277786X
0277786X