학술논문
Langmuir probe plasma parameters and kinetic rates in a Ar-SiH 4 -H2 plasma during nc-Si films deposition for photovoltaic applications
Document Type
Article
Author
Source
In: Journal of Physics D: Applied Physics . (Journal of Physics D: Applied Physics, 2009, 42(22))
Subject
Language
English
ISSN
00223727
13616463
13616463